Phase change memory devices, methods of manufacturing and methods of operating the same

ABSTRACT

A phase change memory device includes a switching device and a storage node connected to the switching device. The storage node includes a bottom stack, a phase change layer disposed on the bottom stack and a top stack disposed on the phase change layer. The phase change layer includes a unit for increasing a path of current flowing through the phase change layer and reducing a volume of a phase change memory region. The area of a surface of the unit disposed opposite to the bottom stack is greater than or equal to the area of a surface of the bottom stack in contact with the phase change layer.

PRIORITY STATEMENT

This non-provisional U.S. patent application claims priority under 35U.S.C. § 119 to Korean Patent Application No. 10-2006-0130442, filed onDec. 19, 2006, in the Korean Intellectual Property Office, the entirecontents of which is incorporated herein by reference.

BACKGROUND Description of the Related Art

A conventional phase change memory device (such as a phase change randomaccess memory (PRAM)) may include a storage node having a phase changematerial layer and a transistor connected to the storage node. When areset current is applied to the phase change memory device, a region incontact with a bottom electrode contact layer of the phase changematerial layer may be heated to a temperature higher than a meltingpoint of the phase change material layer. As a result, the region incontact with the bottom electrode contact layer may become amorphous.The amorphous region may be changed into a crystalline region byapplying a set current to the storage node.

An amorphous region of the phase change material layer may have a higherresistance than other regions of the phase change material layer. As aresult, the value of a current passing through the phase change materiallayer may depend on whether or not an amorphous region exists in thephase change material layer. In one example, when the amorphous regionis present in the phase change material layer, a current supplied to thephase change material layer may be smaller than a reference current, anda data “1” may be read from the PRAM. Conversely, when the amorphousregion is not present in the phase change material layer, a currentpassing through the phase change material layer may be larger than thereference current, and a data “0” may be read from the PRAM. Oppositestandards may be used in deciding whether data “1” or data “0” is readfrom the PRAM.

As integration density of conventional semiconductor memory devicesincreases, transistor size should decrease. As a result, the maximumsustainable current in the transistor may also decrease. In conventionalphase change memory devices, a reset current and a set current may besupplied through the transistor. The reset current may be larger thanthe set current. When transistor size is reduced, the reset current maydecrease so that the smaller transistor may sustain the reset current.

SUMMARY

Example embodiments relate to phase change memory devices, methods ofmanufacturing and methods of operating the same. Phase change memorydevices according to example embodiments may include an expanded currentpath, a reduced memory region and/or reduced program volume, methods ofmanufacturing and methods of operating the same.

Example embodiments provide phase change memory devices, which may haveincreased integration density by reducing a reset current. Exampleembodiments may suppress and/or prevent data loss due to external heat.

At least one example embodiment provides a phase change memory deviceincluding a switching device and a storage node connected to theswitching device. The storage node may include a bottom stack, a phasechange layer disposed on the bottom stack, and a top stack disposed onthe phase change layer. The phase change layer may include a currentpath increase unit for increasing a path of current flowing through thephase change layer. The current path increase unit may also reduce avolume of a phase change memory region.

According to example embodiments, an area of a surface of the currentpath increase unit disposed opposite the bottom stack may be greaterthan or equal to an area of a surface of the bottom stack in contactwith the phase change layer. The current path increase unit may be amaterial layer having a lower electric conductivity than an amorphousregion to be formed in the phase change layer. The material layer may bean insulating layer or a conductive layer. The material layer may have athickness sufficient to suppress and/or prevent tunneling of the currentflowing through the phase change layer.

According to example embodiments, the phase change layer may include aplurality of material layers stacked vertically and spaced from oneanother. In this example, the width of at least a portion of thematerial layers may be different from the width of the other materiallayers. The storage node may further include a plurality of (e.g., two)material layers stacked vertically between the material layers. Theplurality of material layers may be disposed on the same orsubstantially the same level (e.g., in the same plane) and/or spacedover an underlying material layer.

At least one other example embodiment provides a phase change randomaccess memory (PRAM) including a switching device and a storage nodeconnected to the switching device. The storage node may include a bottomstack, a phase change layer having a trench filled with a materiallayer, disposed on the bottom stack, a top stack disposed on the phasechange layer and the material layer. The trench may be filled with amaterial layer. The material layer may have an area greater than orequal to an area of a surface of the bottom stack in contact with thephase change layer. The material layer may have lower electricconductivity than an amorphous region to be formed in the phase changelayer.

According to at least some example embodiments, the storage node mayfurther include a cylindrical material layer disposed apart from thematerial layer to enclose the surface of the bottom stack and thematerial layer. The cylindrical material layer may have lower electricconductivity than the amorphous region to be formed in the phase changelayer. The material layer filled in the trench may extend beyond thecylindrical material layer. The material layer filled in the trench maybe an insulating layer or a conductive layer. The cylindrical materiallayer may have the same or substantially the same electric conductivityas the material layer filling the trench. Alternatively, the cylindricalmaterial may have a different electric conductivity than the materiallayer filled in the trench.

At least one other example embodiment provides a method of manufacturinga memory device (e.g., a PRAM) including a switching device and astorage node connected to the switching device. According to at leastthis method, a storage node may be formed. For example, a first phasechange layer may be formed on an insulating interlayer to cover anexposed surface of a bottom electrode contact layer. A first materiallayer may be formed on a region of the first phase change layer to coverthe exposed surface of the bottom electrode contact layer. A secondphase change layer may be formed on the first phase change layer tocover the first material layer. The first material layer may have alower electric conductivity than an amorphous region formed in the firstphase change layer.

According to at least some example embodiments, the first material layermay be an insulating layer or a conductive layer. A second materiallayer may be formed on the second phase change layer, and a third phasechange layer may be formed on the second phase change layer to cover thesecond material layer. The second material layer may have lower electricconductivity than each of the first through third phase change layers.The second material layer may be formed in a plurality of (e.g., atleast two) separate portions. The plurality of portions may be formedapart from each other such that a space between the plurality ofportions may be positioned over the first material layer. The secondmaterial layer may be formed to have an area greater than or equal tothe first material layer.

According to at least some example embodiments, the first and secondmaterial layers may have the same, substantially the same or differentelectric conductivities. The second material layer may be one of aninsulating layer and a conductive layer.

At least one other example embodiment provides a method of manufacturinga memory device (e.g., a PRAM) including a switching device and astorage node connected to the switching device. According to at leastthis method, a storage node may be formed. For example, a phase changelayer may be formed on an insulating interlayer to cover an exposedsurface of a bottom electrode contact layer. A trench may be formed overthe exposed surface of the bottom electrode contact layer in the phasechange layer, and the trench may be filled with a material layer. A topstack may be formed on the phase change layer and the material layer.The trench may have a bottom surface with at least the same orsubstantially the same area as the exposed surface of the bottomelectrode contact layer. The material layer may have a lower electricconductivity than an amorphous region formed in the phase change layer.

According to at least some example embodiments, before forming the phasechange layer on the insulating interlayer, a cylindrical material layermay be formed on the insulating interlayer to enclose the exposedsurface of the bottom electrode contact layer and the trench. Thematerial layer filling the trench may expand beyond the cylindricalmaterial layer. The cylindrical material layer may have lower electricconductivity than the phase change layer. The material filling thetrench may have different electric conductivity than the cylindricalmaterial layer. The cylindrical material layer may be one of aninsulating layer and a conductive layer.

At least one other example embodiment provides a method of operating amemory device (e.g., a PRAM) including a switching device and a storagenode connected to the switching device. According to at least thismethod, the switching device may be maintained in an on state and anoperating voltage may be applied to the storage node. The operatingvoltage may be one of a write voltage, a read voltage and an erasevoltage.

According to at least some example embodiments, when the operatingvoltage is a read voltage, a current measured in the storage node may becompared with a reference current. The reset current of the memory maybe reduced, which may increase integration density of the memory.Furthermore, the insulating layer included in the phase change layer maysuppress and/or prevent a program volume (e.g., an amorphous region) ofthe phase change layer from being arbitrarily changed into a crystallineregion due to external agents, such as heat. As a result, loss and/orchange of written data may be suppressed and/or inhibited.

BRIEF DESCRIPTION OF THE DRAWINGS

Example embodiments will become more apparent by describing in detailthe example embodiments shown in the attached drawings in which:

FIG. 1 is a cross-sectional view of a phase change memory deviceaccording to an example embodiment;

FIG. 2 is a cross-sectional view of the phase change memory device ofFIG. 1 in which an amorphous region is formed in a phase change layer;

FIG. 3 is a cross-sectional view of a phase change memory deviceaccording to another example embodiment;

FIG. 4 is a cross-sectional view of a phase change memory deviceaccording to another example embodiment;

FIG. 5 is a cross-sectional view of a phase change memory deviceaccording to another example embodiment;

FIGS. 6 through 11 are cross-sectional views for illustrating a methodof manufacturing a phase change memory device according to an exampleembodiment;

FIGS. 12 through 16 are cross-sectional views for illustrating a methodof manufacturing a phase change memory device according to anotherexample embodiment;

FIGS. 17 and 18 are cross-sectional views for partially illustrating amethod of manufacturing a phase change memory device according toanother example embodiment;

FIGS. 19 through 24 are cross-sectional views for partially illustratinga method of manufacturing a phase change memory device according toanother example embodiment;

FIG. 25 is a plan view of a storage node used for a simulation of aphase change memory device according to an example embodiment;

FIG. 26 illustrates a laid state of a left portion of a section takenalong a direction 26-26′ of FIG. 25; and

FIGS. 27 through 31 are photographic images of simulation resultsshowing a variation of a reset current and the temperature distributionof a phase change memory layer of phase change memory devices accordingto example embodiments when an insulating layer is included in the phasechange memory layer.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

Various example embodiments will now be described more fully withreference to the accompanying drawings in which some example embodimentsare shown. In the drawings, the thicknesses of layers and regions areexaggerated for clarity.

Detailed illustrative example embodiments are disclosed herein. However,specific structural and functional details disclosed herein are merelyrepresentative for purposes of describing example embodiments. Thisinvention may, however, may be embodied in many alternate forms andshould not be construed as limited to only the example embodiments setforth herein.

Accordingly, while example embodiments are capable of variousmodifications and alternative forms, embodiments thereof are shown byway of example in the drawings and will herein be described in detail.It should be understood, however, that there is no intent to limitexample embodiments to the particular forms disclosed, but on thecontrary, example embodiments are to cover all modifications,equivalents, and alternatives falling within the scope of the invention.Like numbers refer to like elements throughout the description of thefigures.

It will be understood that, although the terms first, second, etc. maybe used herein to describe various elements, these elements should notbe limited by these terms. These terms are only used to distinguish oneelement from another. For example, a first element could be termed asecond element, and, similarly, a second element could be termed a firstelement, without departing from the scope of example embodiments. Asused herein, the term “and/or,” includes any and all combinations of oneor more of the associated listed items.

It will be understood that when an element or layer is referred to asbeing “formed on,” another element or layer, it can be directly orindirectly formed on the other element or layer. That is, for example,intervening elements or layers may be present. In contrast, when anelement or layer is referred to as being “directly formed on,” toanother element, there are no intervening elements or layers present.Other words used to describe the relationship between elements or layersshould be interpreted in a like fashion (e.g., “between,” versus“directly between,” “adjacent,” versus “directly adjacent,” etc.).

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of exampleembodiments. As used herein, the singular forms “a,” “an,” and “the,”are intended to include the plural forms as well, unless the contextclearly indicates otherwise. It will be further understood that theterms “comprises,” “comprising,” “includes,” and/or “including,” whenused herein, specify the presence of stated features, integers, steps,operations, elements, and/or components, but do not preclude thepresence or addition of one or more other features, integers, steps,operations, elements, components, and/or groups thereof.

Example embodiments of phase change memory devices, methods ofmanufacturing the same and operating the same will now be described morefully hereinafter with reference to the accompanying drawings. In thedrawings, the thicknesses of layers and regions are exaggerated forclarity.

FIG. 1 is a cross-sectional view of a phase change memory deviceaccording to an example embodiment.

Referring to FIG. 1, a first impurity region 12 and a second impurityregion 14 may be formed apart from each other in a substrate 10. Thefirst and second impurity regions 12 and 14 may be doped withconductivity type impurities, for example, n-type or p-type impurities.One of the first and second impurity regions 12 and 14 may be a sourceregion, while the other may be a drain region. A gate stack 20 may bedisposed between the first and second impurity regions 12 and 14 on thesubstrate 10. A channel region 16 may be disposed under the gate stack20. The gate stack 20 may include a gate insulating layer 18 and a gateelectrode 19 stacked sequentially. The substrate 10 having the first andsecond impurity regions 12 and 14 and the gate stack 20 may constitute aswitching device or transistor.

A first insulating interlayer 22 may be disposed on the substrate 10 tocover the transistor. A first contact hole h1 may be formed in orthrough the first insulating interlayer 22 to expose the second impurityregion 14. The first contact hole h1 may be filled with a conductiveplug 24. A bottom electrode 30 may be disposed on the first insulatinginterlayer 22 to cover at least an exposed surface of the conductiveplug 24. For example, bottom electrode 30 may have a size sufficient tocover the exposed portion of the bottom electrode 30, or may have a sizelarger than the exposed portion of the bottom electrode 30 in at leastone direction.

A second insulating interlayer 32 may be stacked on the first insulatinginterlayer 22 to cover the bottom electrode 30. A second contact hole h2may be formed in or through the second insulating interlayer 32 toexpose a portion of the bottom electrode 30. The second contact hole h2may be filled with a bottom electrode contact layer 34. The bottomelectrode 30 and the bottom electrode contact layer 34 may constitute abottom stack. The bottom electrode contact layer 34 may be, for example,a TiN layer, a TiAlN layer or the like. The second insulating interlayer32 may be formed of the same material as the first insulating interlayer22.

A phase change layer 36 may be disposed on the second insulatinginterlayer 32 to cover an exposed surface of the bottom electrodecontact layer 34. For example, phase change layer 36 may have a sizesufficient to cover the exposed surface of the bottom electrode contactlayer 34, or may have a size larger than the exposed surface of thebottom electrode contact layer 34 in at least one direction. In at leastone example embodiment, the phase change layer 36 may be a GeSbTe (GST)layer or a binary, ternary, or quaternary chalcogenide layer. Aninsulating layer 38 may be formed in the phase change layer 36. Theinsulating layer 38 may have a first thickness.

The insulating layer 38 may be, for example, a silicon oxide layer orthe like. Alternatively, the insulating layer 38 may be a nitride layeror another insulating material layer. The insulating layer 38 mayfunction as a current path increase unit for increasing (expanding) apath of current flowing through the phase change layer 36. Although thecurrent path increase unit is shown as insulating layer 38 in FIG. 1,the current path increase unit is not limited to the insulating layer38. For example, any material layer having an electric conductivitylower than that of the phase change layer 36 may function as the currentpath increase unit. Therefore, the insulating layer 38 may be replacedby any suitable material layer having an electric conductivity lowerthan that of the phase change layer 36.

Considering that an amorphous region is formed in the phase change layer36 after a reset current is supplied thereto, the electric conductivityof the insulating layer 38 or the material layer may be lower than thatof the amorphous region of the phase change layer 36. The insulatinglayer 38 may cause a phase change memory region, which may transitioninto an amorphous region (e.g., a program volume), to narrow to a regionbetween the insulating layer 38 and the bottom electrode contact layer34. If the program volume narrows in the phase change layer 36, thedensity of current passing through the program volume may increase morethan when the insulating layer 38 is omitted. This may decrease acurrent required for a memory operation (e.g., a reset current).

The insulating layer 38 may be disposed opposite to the bottom electrodecontact layer 34 and the second insulating interlayer 32, but may bedisposed adjacent to the bottom electrode contact layer 34. Theinsulating layer 38 may have a thickness sufficient to suppress and/orprevent tunneling of a reset current applied to the phase change memorydevice (hereinafter, a reduced or minimum thickness). As a result, ifthe reset current is reduced, the thickness of the insulating layer 38may also be reduced. The insulating layer 38 may suppress and/or preventthe program volume of the phase change layer 36 (e.g., the region of thephase change layer 36) changed from a crystalline state to an amorphousstate when the reset current is supplied thereto, for example, theregion between the insulating layer 38 and the bottom electrode contactlayer 34, from being damaged by heat generated during subsequentprocesses.

FIG. 2 is a cross-sectional view of the phase change memory device ofFIG. 1 in which an amorphous region is formed in a phase change layer.

Referring to FIG. 2, region A1 may be a region of the phase change layer36, which may be changed into an amorphous region due to the insulatinglayer 38. As shown, the region A1 may narrow to a region between theinsulating layer 38 and the bottom electrode contact layer 34. Also, ifa current supplied from the bottom electrode contact layer 34 to a topelectrode 42 bypasses the insulating layer 38 and passes through thephase change layer 36, the current path may expand more than when theinsulating layer 38 is omitted. As described above, because the regionA1 narrows and the current path expands, the current density and/orresistance of the region A1 may increase. As a result, the energy amountat the region A1 may be greater than or equal to that in theconventional art at a smaller current than in the conventional art.Therefore, a reset current supplied to the phase change layer 36 may bereduced as compared to the conventional art. In FIG. 2, a region A2refers to a region where a face-centered cubic (FCC) crystal lattice ischanged into a hexagonal close-packed (HCP) crystal lattice.

Referring back to FIG. 1, a top stack may be formed on the phase changelayer 36. The top stack may include an adhesive layer 40 and a topelectrode 42 stacked sequentially. The adhesive layer 40 may be, forexample, a Ti layer or the like, and the top electrode 42 may be, forexample, a TiN electrode or the like. The bottom stack, the phase changelayer 36, and the top stack may constitute a storage node S.

FIG. 3 is a cross-sectional view of a phase change memory deviceaccording to another example embodiment.

Referring to FIG. 3, a trench 37 may be formed to a first depth in thephase change layer 36. The trench 37 may be filled with an insulatinglayer 38. An adhesive layer 40 may be formed on the phase change layer36 to cover the insulating layer 38, and a top electrode 42 may beformed on the adhesive layer 40. The remaining elements of a phasechange memory device may be the same as the example embodiment shown inFIG. 1.

FIG. 4 is a cross-sectional view of a phase change memory deviceaccording to another example embodiment.

Referring to FIG. 4, a plurality of insulating layers 38, 39, 41 and 43may be formed in a phase change layer 36. The plurality of insulatinglayers 38, 39, 41 and 43 may be stacked at given intervals in a verticaldirection. The insulating layers 38, 39, 41 and 43 may be arranged orconfigured to expand a path of current flowing between a bottomelectrode contact layer 34 and a top electrode 42.

In one example embodiment, two first insulating layers 39 may be spacedapart from each other over the insulating layer 38. In this example, aspace between the two first insulating layers 39 may correspond to(e.g., be aligned with) the center of the insulating layer 38. A secondinsulating layer 41 may be disposed over the first insulating layers 39in a position corresponding to the insulating layer 38. Two thirdinsulating layers 43 may be arranged in the same manner as the firstinsulating layers 39. The remaining elements of a phase change memorydevice may be the same as the example embodiment shown in FIG. 1. Asillustrated in FIG. 4, while passing through the phase change layer 36,a current “I” bypasses the insulating layer 38, may pass between thefirst insulating layers 39, bypass the second insulating layer 41, andpass between the third insulating layers 43.

As described above, a path of the current “I” passing through the phasechange layer 36 may expand more than without the plurality of insulatinglayers 38, 39, 41 and 43. Thus, the resistance of the path of thecurrent “I” may increase more than when the current “I” flows through alinear path. Furthermore, because a region between the insulating layer38 and the bottom electrode contact layer 34 narrows due to theinsulating layer 38, the current density of the region between theinsulating layer 38 and the bottom electrode contact layer 34 mayincrease. Therefore, when the same voltage is applied to the phasechange layer 36 as in the conventional art, a reset current required tochange the region between the insulating layer 38 and the bottomelectrode contact layer 34 into an amorphous region may be reduced ascompared to the conventional art.

FIG. 5 is a cross-sectional view of a phase change memory deviceaccording to another example embodiment.

Referring to FIG. 5, a first insulating layer 52 and a second insulatinglayer 54 may be disposed between a second insulating interlayer 32including a bottom electrode contact layer 34 and an adhesive layer 40.The first insulating layer 52 may be a cylindrical insulating layerspaced apart from the bottom electrode contact layer 34. For example,the first insulating layer 52 may include a first insulating layerportion formed on one side of the bottom electrode contact layer 34, anda second insulating layer portion formed on another side of the bottomelectrode contact layer 34. The first insulating layer 52 may enclosethe bottom electrode contact layer 34.

The second insulating layer 54 may be formed over the first insulatinglayer 52, but the second insulating layer 54 may not contact the firstinsulating layer 52. The second insulating layer 54 may include a middleprotrusion portion 54 a. The middle protrusion portion 54 a may protrudetoward the inside of the cylindrical first insulating layer 52 such thatthe protrusion portion 54 a is relatively close to and faces the bottomelectrode contact layer 34. The remaining portion of the secondinsulating layer 54 expands from the protrusion 54 a outward to thefirst insulating layer 52 and then expands toward the second insulatinginterlayer 32 parallel to an outer surface of the first insulating layer52. The vertical length of an outer portion of the second insulatinglayer 54 may be less than an intermediate portion of the secondinsulating layer 54 (e.g., between the outer portion and the middleprotrusion portion), but less than the vertical length of the middleprotrusion portion 54 a. The horizontal width of the second portion ofthe second insulating layer 54 may be the same as the horizontal widthof the third portion of the second insulating layer 54, but less thanthe horizontal width of the middle protrusion portion 54 a.

A top surface of the second insulating layer 54 may contact the adhesivelayer 40. The length of the top surface of the second insulating layer54 may be less than that of the adhesive layer 40 and/or the topelectrode 42. The first and second insulating layers 52 and 54 may beenclosed by the phase change layer 36. Also, the space between the firstand second insulating layers 52 and 54 may be filled with the phasechange layer 36. The first and second insulating layers 52 and 54 may beformed of the same material as the insulating layer 38 discussed abovewith regard to the example embodiment shown in FIG. 1. Alternatively,the first and second insulating layers 52 and 54 may be formed ofdifferent insulating material. In FIG. 5, for example, a current mayflow through a path 11 from the bottom electrode contact layer 34 to atop electrode 42.

Still referring to FIG. 3, for the same reason as described in theprevious example embodiments, a region A3 between an edge of the bottomelectrode contact layer 34 and the protrusion 54 a of the secondinsulating layer 54 adjacent to the edge of the bottom electrode contactlayer 34 may change into an amorphous region at a lower reset currentthan in the conventional art.

FIGS. 6 through 11 are cross-sectional views for illustrating a methodof manufacturing a phase change memory device according to an exampleembodiment.

Referring to FIG. 6, a gate stack 20 may be formed on a given region ofa substrate 10. The gate stack 20 may be obtained by sequentiallystacking a gate insulating layer 18 and a gate electrode 19 on thesubstrate 10. A conductive impurity may be implanted into the substrate10 using the gate stack 20 as a mask to form first and second impurityregions 12 and 14. The conductive impurity may be, for example, n-typeor a p-type impurity. The gate stack 20 may be interposed between thefirst and second impurity regions 12 and 14. One of the first and secondimpurity regions 12 and 14 may be a source region, while the other onemay be a drain region. The first and second impurity regions 12 and 14and the gate stack 20 may constitute a transistor, which may be one of aplurality of switching devices. A region disposed under (e.g., directlyunder) the gate insulating layer 18 of the substrate 10 (e.g., a regionbetween the first and second impurity regions 12 and 14) may serve as achannel region 16.

A first insulating interlayer 22 may be formed on the substrate 10 tocover the transistor. The first insulating interlayer 22 may be formedof a dielectric material, such as, SiO_(X), SiO_(X)N_(Y), or othersimilar insulating material. A first contact hole h1 may be formedthrough the first insulating interlayer 22 to expose at least a portionof the second impurity region 14. The first contact hole h1 may befilled with a conductive material to form a conductive plug 24. A bottomelectrode 30 may be formed on the first insulating interlayer 22 tocover an exposed surface of the conductive plug 24. The bottom electrode30 may be formed of TiN, TiAlN or the like. Alternatively, the bottomelectrode 30 may be formed of silicide containing ions of a metalselected from the group consisting of or including Ag, Au, Al, Cu, Cr,Co, Ni, Ti, Sb, V, Mo, Ta, Nb, Ru, W, Pt, Pd, Zn, Mg, an alloy thereofand the like.

Referring to FIG. 7, a second insulating interlayer 32 may be formed onthe first insulating interlayer 22 to cover the bottom electrode 30. Thesecond insulating interlayer 32 may be formed of a dielectric material,such as, SiO_(X), SiO_(X)N_(Y) or the like. A second contact hole h2 maybe formed in the second insulating interlayer 32 to partially expose atop surface of the bottom electrode 30. The second contact hole h2 maybe filled with TiN, TiAlN or the like to form a bottom electrode contactlayer 34.

Referring to FIG. 8, a first phase change layer 36 a may be formed onthe second insulating interlayer 32 to cover at least the top surface ofthe bottom electrode contact layer 34. The first phase change layer 36 amay be formed of, for example, GST or the like. Alternatively, the firstphase change layer 36 a may be formed of another phase change material,for example, a binary, ternary, or quaternary chalcogenide material. Thefirst phase change layer 36 a may be formed to a thickness of several toseveral tens of nanometers.

A photoresist pattern 50 may be formed on the first phase change layer36 a. The photoresist pattern 50 may be formed to expose a region of thefirst phase change layer 36 a corresponding to the bottom electrodecontact layer 34 and a portion of the second insulating interlayer 32around the bottom electrode contact layer 34. An insulating layer 38 maybe formed on the photoresist pattern 50 to cover an exposed region ofthe first phase change layer 36 a. The insulating layer 38 may be formedof silicon oxide or other similar insulating material such as nitride orthe like. The insulating layer 38 may be formed to the above-describedthickness or more. The insulating layer 38 may be formed to a smallerthickness based on a reset current to be supplied to the phase changememory device. The insulating layer 38 may be replaced by a materiallayer having any suitable material having an electric conductivity lowerthan that of the first phase change layer 36 a. Thus, the material layermay be an insulating layer or a conductive layer. In one example, thematerial layer may have an electric conductivity lower than that of anamorphous region to be formed in the first phase change layer 36 a. Theabove description regarding the material layer may refer to anyinsulating layer to be formed in a phase change layer as describedlater.

Referring to FIG. 9, the photoresist pattern 50 and a portion of theinsulating layer 38 formed on the photoresist pattern 50 may be removed(e.g., simultaneously) using any suitable lift-off or removal process. Aportion of the insulating layer 38 may remain on a portion of the firstphase change layer 36 a as illustrated in FIG. 9. The remaininginsulating layer 38 may be formed on a portion of the first phase changelayer 36 a corresponding to the bottom electrode contact layer 34 and aportion of the second insulating interlayer 32 disposed around thebottom electrode contact layer 34 with the first phase change layer 36 ainterposed there between.

Referring to FIG. 10, a second phase change layer 36 b may be formed onthe first phase change layer 36 a to cover the insulating layer 38. Thesecond phase change layer 36 b may be formed of the same phase changematerial as the first phase change layer 36 a. A top surface of thesecond phase change layer 36 b may be planarized, and an adhesive layer40 and a top electrode 42 may be sequentially formed on the planarizedsurface of the second phase change layer 36 b. The adhesive layer 40 maybe formed of, for example, Ti or the like, while the top electrode 42may be formed of, for example, TiN, TiAlN or the like.

A photoresist pattern 60 may be formed on the top electrode 42. In thisexample, the photoresist pattern 60 may be formed on a portion of thetop electrode corresponding to the insulating layer 38 and a portion ofthe first phase change layer 36 a disposed around the insulating layer38. The top electrode 42 may be etched using the photoresist pattern 60as an etch mask. The etching process may be sequentially performed onthe adhesive layer 40 and the second and first phase change layers 36 band 36 a to expose the second insulating interlayer 32. As a result, asillustrated in FIG. 11, a phase change layer 36, the adhesive layer 40,and the top electrode 42, each having the same shape as the photoresistpattern 60, may be formed on the second insulating interlayer 32. Thephase change layer 36, the adhesive layer 40 and the top electrode 42may constitute a storage node along with the bottom electrode 30 and thebottom electrode contact layer 34. The photoresist pattern 60 may beremoved after etching.

The formation of a second contact hole h2 in a second insulatinginterlayer 32 and the formation of a bottom electrode contact layer 34in the second contact hole h2 may be the same as described withreference to FIG. 7.

FIGS. 12 through 16 are cross-sectional views for illustrating a methodof manufacturing a phase change memory device according to anotherexample embodiment;

Referring to FIG. 12, a first phase change layer 68 may be formed on thesecond insulating interlayer 32 to cover an exposed surface of thebottom electrode contact layer 34. In this example embodiment, the firstphase change layer 68 may be formed to a thickness greater than thefirst phase change layer 36 a described above. A photoresist pattern 70may be formed on the first phase change layer 68 to expose a region ofthe first phase change layer 68. The exposed region of the first phasechange layer 68 may correspond to the bottom electrode contact layer 34and a portion of the second insulating interlayer 32 disposed around thebottom electrode contact layer 34.

Referring to FIG. 13, the exposed region of the first phase change layer68 may be etched using the photoresist pattern 70 as an etch mask toform a trench 69 having a depth, which protrudes into the first phasechange layer 68. An insulating layer 38 may be formed on the photoresistpattern 70 to fill the trench 69. The insulating layer 38 may be formedof the same material as described above. The photoresist pattern 70 andthe insulating layer 38 formed thereon may be removed (e.g.,simultaneously) using any suitable removal or lift-off process. As aresult, as illustrated in FIG. 14, the remaining insulating layer 38 mayfill the trench 69 and protrude from the first phase change layer 68 toa thickness. A top surface of the remaining insulating layer 38 may beplanarized until a top surface of the first phase change layer 68 isexposed.

Referring to FIG. 15, a second phase change layer 71 may be formed onthe first phase change layer 68 to cover the planarized top surface ofthe insulating layer 38. The second phase change layer 71 may be formedof the same, substantially the same or a different phase change materialas the first phase change layer 68. By forming the second phase changelayer 71, the insulating layer 38 may be sandwiched in a phase changelayer including the first and second phase change layers 68 and 71. Anadhesive layer 40 and a top electrode 42 may be formed on the secondphase change layer 71. Thereafter, a photoresist pattern 60 may beformed as described above with reference to FIG. 10, and a stackedstructure formed on the second insulating interlayer 32 may be etchedusing the photoresist pattern 60 as an etch mask as described above withreference to FIG. 11.

As a result, as illustrated in FIG. 16, a stacked structure includingthe phase change layer 68 and 71, the adhesive layer 40, and the topelectrode 42 may be formed on the second insulating interlayer 32. Thephase change layer 68 and 71, in which the insulating layer 38 may besandwiched, may contact the exposed surface of the bottom electrodecontact layer 34. The stacked structure may constitute a storage nodealong with the bottom electrode contact layer 34.

Because the processes performed until forming a bottom electrode contactlayer 34 on a second insulating interlayer 32 may be the same as theabove-described example embodiments, the detailed description of thoseportions of the following example embodiments begin with subsequentprocesses.

FIGS. 17 and 18 are cross-sectional views for partially illustrating amethod of manufacturing a phase change memory device according toanother example embodiment.

Referring to FIG. 17, a first phase change layer 68 may be formed on thesecond insulating interlayer 32 to cover a top surface of the bottomelectrode contact layer 34. A trench 69 may be formed to a depthextending into the first phase change layer 68. The trench 69 may beformed opposite to the bottom electrode contact layer 34 and a portionof the second insulating interlayer 32 disposed around the bottomelectrode contact layer 34. For example, the trench 69 may be formed ina portion of the first insulating layer 68 corresponding to the bottomelectrode contact layer 34 and a portion of the second insulatinginterlayer 32 disposed around the bottom electrode contact layer 34. Thetrench 69 may be filled with an insulating layer 38.

Referring to FIG. 18, an adhesive layer 40 may be formed on the firstphase change layer 68 to cover the insulating layer 38. A top electrode42 may be formed on the adhesive layer 40. A photoresist pattern 80 maybe formed on the top electrode 42 to define a region in which a storagenode may be formed. The top electrode 42, the adhesive layer 40, and thefirst phase change layer 68 may be sequentially etched using thephotoresist pattern 80 as an etch mask. This etching process may beperformed until the second insulating interlayer 32 is exposed. Afterthe etching process is completed, the photoresist pattern 80 may beremoved.

Because the processes performed until forming a bottom electrode contactlayer 34 on a second insulating interlayer 32 may be the same as theprocesses of the above-described example embodiment, a detaileddescription of this example embodiment will begin with subsequentprocesses.

Referring to FIG. 19, a first phase change layer 36 a may be formed onthe second insulating interlayer 32. An insulating layer 38 may beformed on a first region of the first phase change layer 36 a. In thisexample embodiment, the insulating layer 38 may be formed to theabove-described thickness. The insulating layer 38 may have a centralregion corresponding to the bottom electrode contact layer 34 and mayextend onto a portion of the second insulating interlayer 32 disposedaround the bottom electrode contact layer 34.

Referring to FIG. 20, a second phase change layer 36 b may be formed onthe first phase change layer 36 a to cover the insulating layer 38, anda top surface of the second phase change layer 36 b may be planarized.First insulating layers 39 may be formed on the planarized top surfaceof the second phase change layer 36 b. The first insulating layers 39may be formed spaced at intervals on the insulating layer 38. Theinterval between the first insulating layers 39 may be controlled withinthe range of the insulating layer 38. A third phase change layer 36 cmay be formed on the first insulating layers 39 to fill a space betweenthe first insulating layers 39.

Referring to FIG. 21, a second insulating layer 41 may be formed on aregion of the third phase change layer 36 c. The second insulating layer41 may be formed in the same shape and/or to the same thickness as theinsulating layer 38. The second insulating layer 41 may be formed in aposition corresponding to the position of the space between the firstinsulating layers 39. A fourth phase change layer 36 d may be formed onthe third phase change layer 36 c to cover the second insulating layer41, and a top surface of the fourth phase change layer 36 d may beplanarized.

Referring to FIG. 22, third insulating layers 43 may be formed on theplanarized top surface of the fourth phase change layer 36 d. The thirdinsulating layers 43 may be formed spaced at intervals, and a spacebetween the third insulating layers 43 may be positioned over the secondinsulating layer 41. The space between the third insulating layers 43may be controlled within the range of the second insulating layer 41.The insulating layer 38 and the first through third insulating layers39, 41, and 43 may be formed of SiO₂ or other insulating material, forexample, nitride or the like. The insulating layer 38 and the firstthrough third insulating layers 39, 41, and 43 may be wholly orpartially formed of different insulating materials. For example, theinsulating layer 38 and the second insulating layer 41 may be formed ofSiO₂ or the like, while the first and third insulating layers 39 and 43may be formed of other insulating materials.

Referring to FIG. 23, a fifth phase change layer 36 e may be formed onthe third insulating layers 43 to fill a space between the thirdinsulating layers 43, and a top surface of the fifth phase change layer36 e may be planarized. The first through fifth phase change layers 36 ato 36 e may be formed of the same phase change material, such as GST orother chalcogenide material. Alternatively, at least some of the phasechange layers 36 a through 36 e may be formed of other phase changematerial than remaining phase change layers among 36 a through 36 e. Anadhesive layer 40 and a top electrode 42 may be sequentially formed onthe planarized top surface of the fifth phase change layer 36 e. Aphotoresist pattern 90 may be formed on the top electrode 42 to define aregion in which a storage node may be formed. In this exampleembodiment, the photoresist pattern 90 may be formed in a position fordefining the insulating layer 38, the first and second phase changelayers 36 a and 36 b disposed around the insulating layer 38, the secondinsulating layer 41 and the third and fourth phase change layers 36 cand 36 d disposed around the second insulating layer 41.

Considering a positional relationship between the insulating layer 38and the first insulating layers 39 and a positional relationship betweenthe second insulating layer 41 and the third insulating layers 43, thespace between the first insulating layers 39 and its adjacent portionsof the first insulating layers 39 and the space between the thirdinsulating layers 39 and its adjacent portions of the third insulatinglayers 39 may be defined by the photoresist pattern 90.

A stacked structure formed on the second insulating interlayer 32 may besequentially etched using the photoresist pattern 90 as an etch mask.The etching process may be performed to expose the second insulatinginterlayer 32. As a result, as illustrated in FIG. 24, a stack structureincluding a phase change layer 36 having the first through fifth phasechange layers 36 a to 36 e, the insulating layers 38, 39, 41, and 43,the adhesive layer 40, and the top electrode 42 may be formed on thebottom electrode contact layer 34 and a portion of the second insulatinginterlayer 32 disposed around the bottom electrode contact layer 34. Inthe stacked structure, the insulating layers 38, 39, 41, and 43 may bearranged to expand a current path between the bottom electrode contactlayer 34 and the top electrode 42.

After the etching process is completed, the photoresist pattern 90 maybe removed.

A method of operating the phase change memory device according to anexample embodiment will now be described.

An example embodiment of a method of operating the phase change memorydevice shown in FIG. 1 will be described as an example. However, methodsaccording to example embodiments may be also applied to other phasechange memory devices such as those shown in FIGS. 3 through 5.

Referring again to FIG. 1, a first voltage higher than a thresholdvoltage may be applied to a gate electrode 19 such that a transistorremains turned on. An operating voltage may be applied between a topelectrode 42 and a bottom electrode 30. In at least this exampleembodiment, the operating voltage may be a voltage for supplying a resetcurrent (e.g., a write voltage). In another example embodiment, theoperating voltage may be a voltage for supplying a set current (e.g., anerase voltage). In still another example embodiment, the operatingvoltage may be a voltage for supplying a current between the resetcurrent and the set current (e.g., a read voltage).

As will be appreciated from the following simulation results, when theoperating voltage is a write voltage, a reset current for changing aregion between an insulating layer 38 and a bottom electrode contactlayer 34 into an amorphous state may decrease smaller than in theconventional art.

When the operating voltage is a read voltage, a measured current flowingthrough the phase change layer 36 may be compared with a referencecurrent. When the measured current is smaller than the referencecurrent, a partial region of the phase change layer 36 disposed on acurrent path may be in an amorphous state. As a result, a data “1” maybe written in the phase change memory device of FIG. 1. By contrast,when the measured current is larger than the reference current, a data“0” may be written in the phase change memory device of FIG. 1. Althoughdata “1” and “0” have been described with regard to particular voltagelevels, data may be read and/or written reversely.

An example simulation for showing a variation of a reset current forforming an amorphous region in a phase change layer according to aninsulating layer included in the phase change layer of the phase changememory device according to an example embodiment and the temperaturedistribution obtained when the reset current is supplied was conducted.

FIG. 25 is a plan view of a storage node of the phase change memorydevice used in the simulation. FIG. 26 illustrates a portion of asection cut along a direction 26-26′ of FIG. 25. The plan view of FIG.25 is seen in the arrow direction in FIG. 26. FIG. 26 illustrates onlyan upper portion of the section of the laid resultant structure for thesake of clarity and convenience.

Referring to FIGS. 25 and 26, the phase change layer 99, an insulatinglayer 93, and a bottom electrode contact layer 95 were all processed asa cylindrical type during the simulation.

In the simulation, the phase change layer 99 was formed of GST, thebottom electrode contact layer 95 was formed of TiAlN, and theinsulating layer 93 was formed of SiO₂. The reference numeral 97 denotesan insulating layer formed of SiO₂. The simulation was performed twiceunder different conditions.

In the first simulation, an interval between the insulating layer 93 andthe bottom electrode contact layer 95 was maintained constant, and theinsulating layer 93 was formed to have different diameters W2 of about50 nm and about 100 nm, respectively.

For the second, a diameter W2 of the insulating layer 93 was fixed at alarger value than a diameter W1 of the bottom electrode contact layer95, while an interval between the insulating layer 93 and the bottomelectrode contact layer 95 was formed to different values of about 30 nmand about 10 nm, respectively.

In the two cases, a diameter W3 of the phase change layer 99 was fixedat about 250 nm, and the diameter W1 of the bottom electrode contactlayer 95 was fixed at about 50 nm. Also, a conventional phase changememory device in which a phase change layer does not include aninsulating layer was compared with the phase change memory devicesaccording to example embodiments in the simulation.

FIGS. 27 through 31 are photographic images of simulation resultsshowing a variation of a reset current and the temperature distributionof a phase change memory layer of the phase change memory devicesaccording to example embodiments when an insulating layer is included inthe phase change memory layer.

FIGS. 27 through 29 show results under the foregoing first conditions.FIG. 27 is a photographic image of simulation results of theconventional phase change random access memory (PRAM), while FIGS. 28and 29 are photographic images of simulation results of the PRAMaccording to example embodiments. FIG. 28 shows a case where thediameter W2 of the insulating layer 93 was about 50 nm like the diameterW1 of the bottom electrode contact layer 95, and FIG. 29 shows a casewhere the diameter W2 of the insulating layer 93 was about 100 nm.

Referring to FIGS. 27 through 29, in the conventional PRAM and PRAMsaccording to example embodiments, a temperature measured in a regionwhere the phase change layer 99 contacts the bottom electrode contactlayer 95 was sufficiently raised so as to change the region into anamorphous region.

However, a reset current I_(reset) of the conventional PRAM was 2.04 mAas shown in FIG. 27, while reset currents I_(reset) of the PRAMsaccording to example embodiments were 1.94 mA and 1.88 mA, respectively,which are smaller than the reset current I_(reset) of the conventionalPRAM, as shown in FIGS. 28 and 29.

Even if the diameter W2 of the insulating layer 93 was equal orsubstantially equal to the diameter W1 of the bottom electrode contactlayer 95, the reset current I_(reset) of the PRAM according to exampleembodiments was smaller than that of the conventional PRAM. Also, whenthe insulating layer 93 is included in the phase change layer 99, as adifference between the diameter W2 of the insulating layer 93 and thediameter W1 of the bottom electrode contact layer 95 increased, thereset current I_(reset) of the PRAM according to example embodimentsdecreased.

FIGS. 30 and 31 show results under the foregoing second conditionsaccording to example embodiments. FIG. 30 shows a case where an intervalbetween the insulating layer 93 and the bottom electrode contact layer95 was about 30 nm, and FIG. 31 shows a case where the interval betweenthe insulating layer 93 and the bottom electrode contact layer 95 wasabout 10 nm.

Referring to FIG. 30, when the diameter W2 of the insulating layer 93was greater than the diameter W1 of the bottom electrode contact layer95 and the interval between the insulating layer 93 and the bottomelectrode contact layer 95 was 30 nm, the reset current I_(reset) was1.88 mA, and a region of the phase change layer 99 in contact with thebottom electrode contact layer 95 was completely changed into anamorphous region.

Referring to FIG. 31, when the diameter W2 of the insulating layer 93was greater than the diameter W1 of the bottom electrode contact layer95 and the interval between the insulating layer 93 and the bottomelectrode contact layer 95 was about 10 nm, the reset current I_(reset)was 1.472 mA, and only a region of the phase change layer 99 in contactwith an edge of the bottom electrode contact layer 95 was changed intoan amorphous region.

From the results of FIGS. 30 and 31, when the diameter W2 of theinsulating layer 93 was greater than the diameter W1 of the bottomelectrode contact layer 95, as the interval between the insulating layer93 and the bottom electrode contact layer 95 decreased, the resetcurrent I_(reset) decreased, and a smaller region of the insulatinglayer 93 in contact with the edge of the bottom electrode contact layer95 was changed into an amorphous region.

As described above, the phase change memory device according to exampleembodiments include an insulating layer disposed in the phase changelayer opposite to the bottom electrode contact layer. Due to theinsulating layer, a program volume of the phase change layer changedinto an amorphous region may narrow, and current density may increase inthe program volume. As a result, the program volume may change into theamorphous region with a smaller current than in the conventional art.

Also, a current path between the bottom electrode contact layer and thetop electrode may expand due to the insulating layer. Thus, a resistancein the current path may increase, so that the amorphous region may formin the phase change layer using a smaller reset current than in theconventional art.

Therefore, the reset current of the phase change memory device accordingto example embodiments may be further reduced by considering both areduction in the program volume and an increase in the current path.

According to example embodiments, a phase change memory device mayreduce reset current due to the insulating layer included in the phasechange layer. The reset current of the phase change memory device may befurther reduced by controlling the diameter of the insulating layer anda positional relationship between the bottom electrode contact layer andthe insulating layer. As a result, the integration density of the phasechange memory device may increase.

The insulating layer included in the phase change layer may suppress,prevent and/or cut off the transmission of heat from the externalenvironment into the program volume (e.g., the amorphous region) of thephase change layer. Therefore, the phase change memory device accordingto example embodiments may prevent data from being changed and/or lostdue to external heat. In other words, the reliability of the phasechange memory device according to example embodiments may be maintainedconstant in a relatively poor external environment characterized, forexample, in relatively high temperatures.

In example embodiments, the phase change layers may include phase changematerials, for example, chalcogenide alloys such asgermanium-antimony-tellurium (Ge—Sb—Te), arsenic-antimony-tellurium(As—Sb—Te), tin-antimony-tellurium (Sn—Sb—Te), ortin-indium-antimony-tellurium (Sn—In—Sb—Te),arsenic-germanium-antimony-tellurium (As—Ge—Sb—Te). Alternatively, thephase change material may include an element in GroupVA-antimony-tellurium such as tantalum-antimony-tellurium (Ta—Sb—Te),niobium-antimony-tellurium (Nb—Sb—Te) or vanadium-antimony-tellurium(V—Sb—Te) or an element in Group VA-antimony-selenium such astantalum-antimony-selenium (Ta—Sb—Se), niobium-antimony-selenium(Nb—Sb—Se) or vanadium-antimony-selenium (V—Sb—Se). Further, the phasechange material may include an element in Group VIA-antimony-telluriumsuch as tungsten-antimony-tellurium (W—Sb—Te),molybdenum-antimony-tellurium (Mo—Sb—Te), or chrome-antimony-tellurium(Cr—Sb—Te) or an element in Group VIA-antimony-selenium such astungsten-antimony-selenium (W—Sb—Se), molybdenum-antimony-selenium(Mo—Sb—Se) or chrome-antimony-selenium (Cr—Sb—Se).

Although the phase change material is described above as being formedprimarily of ternary phase-change chalcogenide alloys, the chalcogenidealloy of the phase change material could be selected from a binaryphase-change chalcogenide alloy or a quaternary phase-changechalcogenide alloy. Example binary phase-change chalcogenide alloys mayinclude one or more of Ga—Sb, In—Sb, In—Se, Sb₂—Te₃ or Ge—Te alloys;example quaternary phase-change chalcogenide alloys may include one ormore of an Ag—In—Sb—Te, (Ge—Sn)—Sb—Te, Ge—Sb—(Se—Te) or Te₈₁—Ge₁₅—Sb₂—S₂alloy, for example.

In an example embodiment, the phase change material may be made of atransition metal oxide having multiple resistance states, as describedabove. For example, the phase change material may be made of at leastone material selected from the group consisting of NiO, TiO₂, HfO,Nb₂O₅, ZnO, WO₃, and CoO or GST (Ge₂Sb₂Te₅) or PCMO(Pr_(x)Ca₁-xMnO₃).The phase change material may be a chemical compound including one ormore elements selected from the group consisting of S, Se, Te, As, Sb,Ge, Sn, In and Ag.

While example embodiments have been particularly shown and describedwith reference to the example embodiments shown in the figures, it willbe understood by those of ordinary skill in the art that various changesin form and details may be made therein without departing from thespirit and scope of the present invention as defined by the followingclaims.

1. A phase change memory device comprising: a switching device; and astorage node connected to the switching device; wherein the storage nodeincludes, a bottom stack, a phase change layer disposed on the bottomstack, and a top stack disposed on the phase change layer, wherein thephase change layer includes a current path increase unit configured toincrease a path of current flowing through the phase change layer. 2.The phase change memory device of claim 1, wherein an area of a surfaceof the current path increase unit disposed on the bottom stack isgreater than or equal to an area of a surface of the bottom stack incontact with the surface of the phase change layer.
 3. The phase changememory device of claim 2, wherein the current path increase unit is amaterial layer having a lower electric conductivity than an amorphousregion of the phase change layer.
 4. The phase change memory device ofclaim 3, wherein the material layer is one of an insulating layer and aconductive layer.
 5. The phase change memory device of claim 3, whereinthe material layer includes a plurality of material layers stackedvertically and spaced from one another.
 6. The phase change memorydevice of claim 5, wherein widths of at least a portion of the materiallayers are different.
 7. The phase change memory device of claim 5,further including, at least two material layers, each material layer ofthe at least two material layers having a lower electric conductivitythan an amorphous region of the phase change layer, wherein the at leasttwo material layers are arranged on a plane and spaced apart over anunderlying material layer.
 8. The phase change memory device of claim 1,wherein the top stack includes an adhesive layer and a top electrodestacked sequentially.
 9. The phase change memory device of claim 1,wherein the phase change layer arranged on the bottom stack includes atrench, the phase change memory device further including, a materiallayer formed in the trench, wherein the top stack is disposed on thephase change layer and the material layer, the material layer has anarea greater than or equal to an area of a surface of the bottom stackthat is in contact with the phase change layer, and the material layerhas a lower electric conductivity than an amorphous region of the phasechange layer.
 10. The phase change memory device of claim 9, wherein thematerial layer is an insulating layer or a conductive layer.
 11. Thephase change memory device of claim 9, further including, a cylindricalmaterial layer disposed apart from the material layer, the cylindricalmaterial layer enclosing the surface of the bottom stack and thematerial layer, the cylindrical material layer having a lower electricconductivity than the amorphous region of the phase change layer. 12.The phase change memory device of claim 11, wherein the material layerformed in the trench extends beyond the cylindrical material layer. 13.The phase change memory device of claim 11, wherein the cylindricalmaterial layer has a different electric conductivity than the materiallayer formed in the trench.
 14. The phase change memory device of claim11, wherein the material layer is an insulating layer or a conductivelayer.
 15. A method of manufacturing a phase change memory device, themethod comprising: forming a storage node connected to a switchingdevice, the forming of the storage node including, forming a first phasechange layer on an insulating interlayer, the first phase change layerbeing formed to cover an exposed surface of a bottom electrode contactlayer, forming a first material layer on a first region of the firstphase change layer, the first material layer being formed to cover theexposed surface of the bottom electrode contact layer, and the firstmaterial layer having a lower electric conductivity than an amorphousregion of the first phase change layer, and forming a second phasechange layer on the first phase change layer, the second phase changelayer being formed to cover the first material layer.
 16. The method ofclaim 15, wherein the first material layer is an insulating layer or aconductive layer.
 17. The method of claim 15, further including, forminga second material layer on the second phase change layer, and forming athird phase change layer on the second phase change layer, the thirdphase change layer covering the second material layer, wherein thesecond material layer has a lower electric conductivity than each of thefirst, second and third phase change layers.
 18. The method of claim 17,wherein the second material layer is formed to include at least twoportions, the at least two portions being formed apart from each other,leaving a space between the at least two portions above the firstmaterial layer.
 19. The method of claim 17, wherein the second materiallayer is formed to have an area greater than or equal to an area of thefirst material layer.
 20. The method of claim 17, wherein the first andsecond material layers have the same electric conductivity.
 21. Themethod of claim 17, wherein the second material layer is an insulatinglayer or a conductive layer.
 22. The method of claim 15, furtherincluding, forming a trench over the exposed surface of the bottomelectrode contact layer in the first phase change layer, the trenchhaving a bottom surface, the bottom surface having an area at least thesame as an area of the exposed surface of the bottom electrode contactlayer, and forming a material layer in the trench, wherein the top stackis formed on the second phase change layer, and the material layer has alower electric conductivity than an amorphous region of the phase changelayer.
 23. The method of claim 22, further including, forming acylindrical material layer on the insulating interlayer, the cylindricalmaterial layer being formed to enclose the exposed surface of the bottomelectrode contact layer and the trench, the cylindrical material layerbeing formed before the forming of the phase change layer on theinsulating interlayer.
 24. The method of claim 23, wherein the formingof the material layer in the trench includes, expanding the materiallayer beyond the cylindrical material layer.
 25. The method of claim 23,wherein the cylindrical material layer has a lower electric conductivitythan that of the phase change layer.
 26. The method of claim 23, whereinthe material layer formed in the trench has a different electricconductivity than that of the cylindrical material layer.
 27. The methodof claim 23, wherein the cylindrical material layer is an insulatinglayer or a conductive layer.
 28. A method of operating a phase changememory device including a storage node connected to the switchingdevice, the storage node including a phase change layer arranged on abottom stack, and a top stack disposed on the phase change layer, thephase change layer including a current path increase unit configured toincrease a path of current flowing through the phase change layer, themethod comprising: maintaining the switching device in an active state;and applying an operating voltage to the storage node.
 29. The method ofclaim 28, wherein the operating voltage is one of a write voltage, aread voltage and an erase voltage.
 30. The method of claim 28, whereinthe current path increase unit is a material layer having lower electricconductivity than the phase change layer.
 31. A method of manufacturinga phase change memory device including a switching device and a storagenode connected to the switching device, the method comprising: formingthe storage node, wherein the forming of the storage node includes,forming a phase change layer on an insulating interlayer to cover anexposed surface of a bottom electrode contact layer, forming a trenchover the exposed surface of the bottom electrode contact layer in thephase change layer, the trench having a bottom surface with at least thesame area as the exposed surface of the bottom electrode contact layer,filling the trench with a material layer, and forming a top stack on thephase change layer and the material layer, the material layer having alower electric conductivity than an amorphous region to be formed in thephase change layer.
 32. The method of claim 31, further including,forming a cylindrical material layer on the insulating interlayer toenclose the exposed surface of the bottom electrode contact layer andthe trench before the forming of the phase change layer on theinsulating interlayer.
 33. The method of claim 32, wherein the fillingof the trench with the material layer includes, expanding the materiallayer beyond the cylindrical material layer.
 34. The method of claim 32,wherein the cylindrical material layer has a lower electric conductivitythan that of the phase change layer.
 35. The method of claim 32, whereinthe material filled in the trench has a different electric conductivitythan that of the cylindrical material layer.
 36. The method of claim 32,wherein the cylindrical material layer is one of an insulating layer anda conductive layer.